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{"sheet":"Sheet1","index":0,"n_rows":213,"n_cols":9,"rows_kept":213,"cut":false,"hidden":false,"merged":[[168,1,168,4],[180,1,180,3],[112,1,112,3],[121,1,121,4]],"flags":["formulas_cached_only"]}
[]
[]
[1,"System Dimension"]
[]
[null,"General"]
[null,null,"Dimension (mm) :",null,null,null,"1000(W) x 900(D) x 1400(H)"]
[null,null,"Weight",null,null,null,"250 kg"]
[null,null,"Color",null,null,null,"White"]
[]
[]
[2,"Chamber Module"]
[]
[null,"Process Chamber "]
[null,null,"Chamber material :",null,null,null,"Anodized aluminum (Cylinder type)"]
[null,null,"Wafer loading/unloading :",null,null,null,"Top plate open type"]
[null,null,"Port : ",null,null,null,"Vacuum port, View port(NW25 1 ea), Pressure gauge port"]
[]
[null,"ICP Source"]
[null,null,"Top plasma source "]
[null,null,null,"Inductively coupled plasma source (PCB type; patented: No.10-0734954)"]
[null,null,null,"Plasma uniformity : ",null,null,"<± 5%"]
[null,null,null,"Plasma density :",null,null,"> 1012 / ㎤"]
[null,null,null,"Electron temperature : ",null,null," 2 ~ 5eV"]
[null,null,null,"Water cooling or Forced-air cooling"]
[null,null,null,"Power for Top plasma source :  ",null,null,"1kW, 13.56MHz "]
[{"$nulls":6},"Forced-air cooling"]
[{"$nulls":6},"PF power on/off (Digital input)"]
[{"$nulls":6},"Interlock (Analog input)"]
[{"$nulls":6},"AC power input (VCTF-3)"]
[{"$nulls":6},"RF output connector (N-type female)"]
[{"$nulls":6},"User port connector (25-pin D-sub, female)"]
[{"$nulls":6},"RS232 (9-pin D-sub, female)"]
[{"$nulls":6},"Front panel (LCD display; 4X20)"]
[{"$nulls":6},"Overcurrent protection (15A circuit breaker on rear panel)"]
[{"$nulls":6},"Case (EMI shield ground)"]
[null,null,null,"Matching network for  : ",null,null,"1kW, 13.56MHz "]
[null,null,null,"Top plasma source",null,null,"Installed Vacuum variable capacitor 2ea"]
[{"$nulls":6},"Forced-air cooling"]
[{"$nulls":6},"Lock-in type detection sensor (Band width : 200kHz)"]
[{"$nulls":6},"Digital-controlled system (DSP controlled)"]
[{"$nulls":6},"Matcher and Controller Combination"]
[{"$nulls":6},"Auto-matching"]
[{"$nulls":6},"Software suppot"]
[{"$nulls":6}," - Windows-based user interface :  Matching time display"]
[{"$nulls":8},"                     Power meter display"]
[{"$nulls":8},"                     Tracking smith chart monitoring "]
[{"$nulls":8},"                     Capacitor setting and monitoring"]
[null,null,"Bottom plasma source"]
[null,null,null,"Capacitively coupled plasma (Bottom electrode)"]
[null,null,null,"Power for Bottom plasma source :  ",null,null,"600W, 12.56MHz "]
[{"$nulls":6},"Forced-air cooling"]
[{"$nulls":6},"Analog I/O control"]
[null,null,null,"Matching network for  : ",null,null,"600W, 12.56MHz "]
[null,null,null,"Bottom plasma source",null,null,"Installed Vacuum variable capacitor 2ea"]
[{"$nulls":6},"Forced-air cooling"]
[{"$nulls":6},"Analog I/O control"]
[]
[null,"Substrate for Bottom Source"]
[null,null,"Substrate (Sample) size :",null,null,null,"Max. Wafer 4 inch  applicable"]
[null,null,"Substrate capacity :",null,null,null,"single substrate"]
[null,null,"Mechanical chuck :",null,null,null,"Ceramic type"]
[null,null,"Water cooling"]
[]
[]
[3,"Vacuum Module"]
[]
[null,"Vacuum Pump"]
[null,null,"Rotary pump "]
[null,null,null,"Pumping speed : ",null,null,"408L/min"]
[null,null,null,"Oil rotary pump"]
[null,null,null,"Inlet / Exhaust flange : NW25 / NW25"]
[]
[null,null,"Ultimate pressure : ",null,null,null,"3×10-3 Torr (PC)"]
[]
[null,null,"Turbo-pump(Alcatel) "]
[null,null,null,"Pumping speed : ",null,null,"400L/sec (N2), Corrsive type"]
[null,null,null,"Rotational speed : ",null,null,"27,000 rpm"]
[null,null,null,"Purging nitrogen flow rate :",null,null," 50sccm"]
[null,null,null,"Inlet / Exhaust flange : DN 100 ISO-K / DN 40"]
[null,null,null,"N2 purge valve installed"]
[null,null,"Ultimate pressure : ",null,null,null,"5×10-6 Torr "]
[]
[]
[null,"Pressure Gauge (PC) "]
[null,null,"High vacuum gauge(MKS) :",null,null,null,"Cold cathode gauge(with controller) "]
[null,null,"Low vacuum gauge "]
[null,null,"Process gauge(MKS) :",null,null,null,"Baratron gauge(CDG: 1 Torr F.S. )"]
[null,null,"Pressure readout & cable kit"]
[]
[null,"Vacuum Pressure Control"]
[null,null,"APC(Automatic Pressure Control)"]
[null,null,null,"Automatic throttle valve "]
[null,null,null,"Throttle valve controller"]
[]
[null,"Vacuum Valve"]
[null,null,"Main valve :",null,null,null,"Pneumatic type angle valve"]
[null,null,"Fore line valve :",null,null,null,"Pneumatic type angle valve"]
[null,null,"Roughing line valve :",null,null,null,"Pneumatic type angle valve"]
[]
[null,"Vacuum Line"]
[null,null,"Auto vent line"]
[null,null,"SUS hard line and flexible bellows line"]
[]
[4,"Gas Supply Module"]
[]
[null,"Used Gases & Flow Control"]
[null,null,"Process gas:",null,"CH1","MFC(MKS)","CHF3","100 SCCM"]
[{"$nulls":4},"CH2","MFC(MKS)","BCl3","50 SCCM"]
[{"$nulls":4},"CH3","MFC(MKS)","Cl2","50 SCCM"]
[null,null,"Purge & vent :",null,"N2 –",null,"Metering valve"]
[null,null,"Filter casket for each channel"]
[]
[null,"Gas Valves & Gas line"]
[null,null,"It used swagelok pneumatically operated diaphragm valves, which is Air-actuated(N/C)"]
[null,null,"Metering valve for N2 purge and vent"]
[null,null,"Tubing of 316L stainless steel"]
[null,null,"All gas lines are welded by auto-welding method with VCR fitting."]
[]
[]
[5,"Process Capacity (Data)"]
[]
[null,"Etching Process Data"]
[null,null,"Etching Unformity (Within Wafer, Wafer to Wafer):"]
[null,null,null,"a-Si, SiO2(Oxide),Si3N4",null,null,"≤ 2.5%  "]
[null,null,null,"Metal",null,null,"≤ 3%  "]
[null,null,null,"ITO",null,null,"≤ 3%  "]
[null,null,null,"Sapphire",null,null,"≤ 3%  "]
[null,null,null,"GaN",null,null,"≤ 3%  "]
[null,null,null,"GaAs",null,null,"≤ 3%  "]
[null,null,null,"Polymer",null,null,"≤ 2%  "]
[null,null,"Etching Rate :"]
[null,null,null,"a-Si",null,null,"> 450nm/min"]
[null,null,null,"SiO2(Oxide)",null,null,"> 400nm/min"]
[null,null,null,"Si3N4",null,null,"> 500nm/min"]
[null,null,null,"Metal",null,null,"> 400nm/min"]
[null,null,null,"ITO",null,null,"> 400nm/min"]
[null,null,null,"Sapphire",null,null,"> 500nm/min"]
[null,null,null,"GaN",null,null,"> 500nm/min"]
[null,null,null,"GaAs",null,null,"> 500nm/min"]
[null,null,null,"Polymer",null,null,"> 500nm/min"]
[null,null,"Profile :"]
[null,null,null,"a-Si",null,null,"≤   90 ± 2˚ "]
[null,null,null,"SiO2(Oxide)",null,null,"≤   90 ± 2˚ "]
[null,null,null,"Si3N4",null,null,"≤   90 ± 2˚ "]
[null,null,null,"Metal",null,null,"≤   90 ± 2.5˚ "]
[null,null,null,"ITO",null,null,"≤   90 ± 2.5˚ "]
[null,null,null,"Sapphire",null,null,"≤   90 ± 2.5˚ "]
[null,null,null,"GaN",null,null,"≤   90 ± 2.5˚ "]
[null,null,null,"GaAs",null,null,"≤   90 ± 2.5˚ "]
[null,null,null,"Polymer",null,null,"≤   90 ± 1.5˚ "]
[null,null,"Selectivity :"]
[null,null,null,"Si : PR",null,null,">     25 : 1 "]
[null,null,null,"Si : SiO2",null,null,">   50 : 1"]
[null,null,null,"SiO2(Oxide) : PR",null,null,">     8 : 1"]
[null,null,null,"Si3N4 : PR",null,null,">     8 : 1"]
[null,null,null,"SiO2(Oxide) : Si",null,null,">   12 : 1"]
[null,null,null,"Metal : PR",null,null,">     5 : 1"]
[null,null,null,"Sapphire : SiO2",null,null,">     10 : 1"]
[null,null,null,"GaN : SiO2",null,null,">     10 : 1"]
[null,null,null,"GaAs : PR",null,null,">     4 : 1"]
[null,null,"Process Pressure (PM) :",null,null,null,"수 ~ 수십 mTorr"]
[null,null,"Leak Rate :",null,null,null,"≤ 5mTorr / min"]
[null,null,"Gas Flow Tolerance :",null,null,null,"≤ ± 10%"]
[null,null,"Forward RF Power Tolerance :",null,null,null,"≤ ± 1% of Setting Power"]
[null,null,"Etching Process Tuning Data Provision"]
[]
[6,"Control Module"]
[]
[null,"System Control"]
[null,null,"Automatic process controller"]
[null,null,null,"PLC-based automation",{"$nulls":4},"     "]
[null,null,null,"LCD touch panel"]
[null,null,null," (7inch TFT, 32bit RISC CPU)"]
[]
[null,"Manual Switch : ",null,"On/Off switch"]
[null,null,null,"Emergency switch"]
[]
[]
[7,"Inner Utility Module of ICP-RIE"]
[]
[null,"Utility Specification"]
[null,null,"Electric power"]
[null,null,null,"Voltage : ",null,null,"208VAC±10%"]
[null,null,null,"Current :",null,null,"50A"]
[null,null,null,"Frequency",null,null,"60Hz"]
[null,null,null,"Phase",null,null,"3 phase"]
[null,null,null,"Connection",null,null,"7 m cable"]
[null,null,"Cooling water"]
[null,null,null,"Flow :",null,null,"2 ~ 3 lpm"]
[null,null,null,"Pressure : ",null,null,"3 ~ 5 kgf/㎠"]
[null,null,null,"Temperature",null,null,"15 ~ 25 ℃"]
[null,null,null,"Connection",null,null,"6mm fitting"]
[null,null,"Compressed air"]
[null,null,null,"Flow :",null,null,"3 lpm"]
[null,null,null,"Pressure : ",null,null,"3 ~ 5 kgf/㎠"]
[null,null,null,"Connection",null,null,"6mm push fit"]
[null,null,"Purge nitrogen"]
[null,null,null,"Flow :",null,null,"2 lpm"]
[null,null,null,"Pressure : ",null,null,"1 ~ 3 kgf/㎠"]
[null,null,null,"Purity",null,null,0.999]
[null,null,null,"Connection",null,null,"1/4 inch SUS fitting"]
[]
[]
[8,"Warranty"]
[]
[null,"Manufacturer warrants for a period of  one(1) year from the final acceptance."]
[null,"All consumable, such as O-rings, CF gasket, ceramic parts, view port glasses, gauge sensors and others,"]
[null,"are entirely excluded from warranty."]
[]
[]
[9,"Remark"]
[null,null,"Parts :"," - 소모성 parts가 아닌 수순하게 PLC를 운영하는 Software 결함, 장비 설계가 잘 못 되어 일어 날 수 있는 Hardware 오 동작, "]
[null,null,null,"   가공 불량, 등에 대한 warranty는 무상으로 엔지니어를 파견"]

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