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[]
["시방서(Photolithography 장비)"]
[]
[null,"Item","Specifications"]
["Mask Aligner Tooling Ststem","Contact Mode","PLC & PC Control system(PC포함)"]
[null,"Mask Size ","Max 5\""]
[null,"Sample Size","25mm, 2\", 4\""]
[null,"Chuck Motion","X,Y,Z & θ Axis Manual "]
[null,"Chuck Leveling","Wedge Error Compensation system"]
["UV Light Source","Beam Size","6.25\"×6.25\""]
[null,"Lamp Power","350W UV Lamp"]
[null,"Beam Uniformity","≤±3%"]
[null,"365nm Intensity","≤ Max 30㎽"]
[null,"Near UV Light Source","350nm to 450nm"]
["Scope Module","Scope","Dual Micro Scope"]
[null,"Manual Moving Stage","X,Y,Z Axis"]
[null,"Objective spacing","50~120mm"]
[null,"Moving Range","Y Axis ±20mm"]
[null,"Monitor","21\" LCD"]
[null,"Magnification","80X~1000X"]
[null,"Prism attachment","30mm"]
[null,"Working Distaance","32mm/86mm"]
["Stage & Control Module","Exposure Time","0.1~999sec"]
[null,"Manual Moving Stage","X,Y,Z Axis"]
[null,"X,Y","±5mm"]
[null,"z","10mm"]
[null,"Theta","±4°"]
[null,"Contact Mode","Vacuum/Hard/Soft contact/"]
[null,null,"Proximity (Gap adjustable)"]
[null," Alignment Accurancy","±1.0㎛"]
["Vibtation Isolation Table","Isolation size","1000×1000×20t"]
[null,"Top Plate","Steel"]
[null,"Top skin","SUS 304 H/L"]
[null,"Height","750mm (From Floor to Top)"]
[null,"Leveling","3-Point self leveling"]
[null,"Natural Frequency","vertical : 1.2~1.5Hz"]
[null,null,"Horizontal : 1.5~1.8Hz"]
[null,null,"사각 Arm rest 부착"]
[null,null,"Under shelf 부착"]
[null,"Air",">5㎏f/㎠"]
["Resolution             Thin PR AZ7610 1㎛ @ Full size Si wafer","Vacuum contact","±1㎛"]
[null,"Hard   contact","±2㎛"]
[null,"Soft   contact","±3㎛"]
[null,"Proximity contact","±5㎛"]
["Utility","Electric Power","220VAC, 1Ø,15A"]
[null,"N2","40psi"]
[null,"OFA","85psi"]
[null,"Vacuum ","<-200mBar (vacuum pump Include)"]
[]
["*기타요구사항"]
["1. I/G/H -line filter"]
["2. Mask holder"]
["3. 동일사항 제품에 대해 최근 3년간 5건이상, 2억5천만원이상 납품실적이 있어야 함\n(납품실적은 계약서나 세금계산서로 증빙)"]